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ORIGINAL PAPER
Algorithm of input data preparation for single-beam pattern generator in industry-oriented applications
1
National Academy of Sciences of Belarus, United Institute of Informatics Problems, Laboratory of System Identification
Journal of Research and Applications in Agricultural Engineering 2015;60(2):26-30
KEYWORDS
ABSTRACT
In this paper, a new algorithm for an automated system of input data preparation for integrated circuit layout generator is proposed. A problem of covering polygons with rectangles is considered. The rectangles must lie entirely within the polygon and it is preferable to cover the polygon with few rectangles as possible. Functions and a structure of the software are de-scribed and given some examples of data processing. Results described in this paper can be applied in computational geometry and image analysis in industry-oriented applications.
REFERENCES (14)
1.
Axelrad V. et al: Analysis of microlithography in an open architecture TCAD System. Optical Laser Microlithography IX, Proc. SPIE, 1996, vol. 21-26, p. 648-659.
2.
Levenson M. D.: Wavefront engineering from 500 nm to 100 nm CD. Optical Microlithography X: Proc. SPIE. 1997. vol. 3051, p. 2-13.
3.
Iwai H.: Future semiconductor manufacturing-challenges and opportunities. IEDM Teach. Dig., 2004, p. 1-16.
4.
Feinberg V. Z.: Geometrical problems of machine schedulers for VLSI. М.: Radio and Sviaz, 1987, 178 p.(in Russian).
5.
De Micheli G.: Synthesis and optimization of digital circuits. New York: McGraw-Hill, 1994, 578 p.
6.
De Berg Mark, Van Kreveld Marc, Overmars Marc, Schwarzkopf Otfried: Computational Geometry: algorithms and applications. 2nd edition. Springer-Verlag, 2000, 367 p.
7.
Du Q., Wang D.: Resent progress in robust and quality Delanay mesh generation. J. of Comp. and App. Math., 2006, v. 195, p. 8-23.
8.
Berman P., Dasgupta B.: Approximating Rectilinear Polygon Cover Problems. Algorithmica, 17(4), 1997, p. 331-356.
9.
Kwok-Kit Wong A.: Optical Imaging in Projection Microlithography. Ser. Tutorial Text in Optical Engineering. Bellingham, WA: SPIE, 2001.
10.
Owa S. at al: Current status and future prospect of immersion lithography. Proc. SPIE, 2006, vol. 6154, 61 5408-1.
11.
Mashohor S., Evans J. R., Arslan T.: Elitist selection schemes for genetic algorithm based printed circuit board inspection system. Evolutionary Comp., 2005, 2, p. 974-978.
12.
Rubin S.M. Computer Aids for VLSI Design [Electronic re-source] - Mode of access: http://www.rulabinsky.com/cavd.... - Date of access: 19.08.2015.
13.
Technical description and instructions for operating GI EМ-5109. Minsk: Planar, 2001, 323 p.
14.
CATS [Electronic resource] - Mode of access: https://www.synopsys.com/Tools.... - Date of access: 19.08.2015.
| eISSN: | 2719-423X |
| ISSN: | 1642-686X |
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